當(dāng)前位置:首頁 > 產(chǎn)品中心 > 二維材料 > 六方氮化硼晶體 > 基于285nm二氧化硅基底的單層氮化硼薄膜
簡要描述:Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 packProperties of BN film97% coverage with minor holes and organic residuesHigh Crystalline Quali
相關(guān)文章
Related Articles詳細(xì)介紹
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
產(chǎn)品咨詢
掃一掃以下二維碼了解更多信息
銷售微信咨詢
網(wǎng)站二維碼